Structural and opto-electrical properties of Al doped ZnO sputtered thin films
作者： Z. Laghfour , T. Ajjammouri , S. Aazou , S. Refki , D. V. Nesterenko
DOI: 10.1007/S10854-015-3277-8
关键词:
摘要: Transparent and conductive aluminum-doped zinc oxide (AZO) thin films with high preferential c-axis orientation have been deposited on glass substrates by radio frequency magnetron sputtering method of ZnO DC Al. Structural, surface morphology, optical electrical properties were studied X-ray diffraction, scanning electron microscope, ultraviolet–visible spectrophotometer, plasmon spectroscopy Hall effect measurements. The results show that AZO are polycrystalline exhibit the hexagonal wurzite crystal structure a preferred along (002) direction. When power supplied to Al target increases, crystallinity decreases while resistivity increases. average measured transmittance exceeded 75 % in visible range for all films. band gap values increase decreasing concentrations.
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Martin Y. Zhang, Qiong Nian, Gary J. Cheng, Room temperature deposition of alumina-doped zinc oxide on flexible substrates by direct pulsed laser recrystallization Applied Physics Letters. ,vol. 100, pp. 151902- ,(2012) , 10.1063/1.3702460
Kyoung-Kook Kim, Hyunsoo Kim, Sung-Nam Lee, Soohaeng Cho, Structural, optical, and electrical properties of E-beam and sputter-deposited ITO films for LED applications Electronic Materials Letters. ,vol. 7, pp. 145- 149 ,(2011) , 10.1007/S13391-011-0610-0
Saif-ur Rehman, Anouar Rahmouni, Tarik Mahfoud, Dmitry V. Nesterenko, Zouheir Sekkat, Determination of the Optical Thickness of sub 10-nm Thin Metal Films by SPR Experiments Plasmonics. ,vol. 9, pp. 381- 387 ,(2014) , 10.1007/S11468-013-9635-6
Hong-ming Zhou, Dan-qing Yi, Zhi-ming Yu, Lai-rong Xiao, Jian Li, Preparation of aluminum doped zinc oxide films and the study of their microstructure, electrical and optical properties Thin Solid Films. ,vol. 515, pp. 6909- 6914 ,(2007) , 10.1016/J.TSF.2007.01.041
Z.A. Wang, J.B. Chu, H.B. Zhu, Z. Sun, Y.W. Chen, S.M. Huang, Growth of ZnO:Al films by RF sputtering at room temperature for solar cell applications Solid-state Electronics. ,vol. 53, pp. 1149- 1153 ,(2009) , 10.1016/J.SSE.2009.07.006
Mujdat Caglar, Saliha Ilican, Yasemin Caglar, Fahrettin Yakuphanoglu, The effects of Al doping on the optical constants of ZnO thin films prepared by spray pyrolysis method Journal of Materials Science: Materials in Electronics. ,vol. 19, pp. 704- 708 ,(2008) , 10.1007/S10854-007-9386-2
Zhiyun Zhang, Chonggao Bao, Wenjing Yao, Shengqiang Ma, Lili Zhang, Shuzeng Hou, Influence of deposition temperature on the crystallinity of Al-doped ZnO thin films at glass substrates prepared by RF magnetron sputtering method Superlattices and Microstructures. ,vol. 49, pp. 644- 653 ,(2011) , 10.1016/J.SPMI.2011.04.002
Se Hun Park, Sang Eun Park, Jung Chul Lee, Pung Keun Song, Jin Ho Lee, Photoluminescence Characterization of Al-Doped ZnO Films Deposited by Using DC Magnetron Sputtering Journal of the Korean Physical Society. ,vol. 54, pp. 1344- 1347 ,(2009) , 10.3938/JKPS.54.1344
K. Nouneh, T. Ajjammouri, Z. Laghfour, A. Maaroufi, M. Abd-Lefdil, D. Chaumont, Z. Sekkat, Structural and spectral properties of ZnO nanorods by wet chemical method for hybrid solar cells applications Materials Letters. ,vol. 139, pp. 26- 30 ,(2015) , 10.1016/J.MATLET.2014.09.141
J.F. Chang, W.C. Lin, M.H. Hon, Effects of post-annealing on the structure and properties of Al-doped zinc oxide films Applied Surface Science. ,vol. 183, pp. 18- 25 ,(2001) , 10.1016/S0169-4332(01)00541-4