Phase Composition and Microstructure as a Function of Deposition Conditions for Potassium Tantalate Niobate Thin Films Grown by Pulsed Laser Deposition
作者： C.M. Cotell , R.E. Leuchtner
DOI: 10.1557/PROC-285-367
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摘要: Potassium tantalate niobate [K(Ta1−xNbx)O3 or KTN] films were deposited by pulsed laser deposition (PLD) on (100)MgO substrates from targets of KTN with x=0.45. The effects substrate temperature (300–700°C) and ambient oxygen pressure (50 300 mTorr) the characteristics investigated. At 500°C mTorr, amorphous a few isolated, randomly-oriented crystalline grains perovskite pyrochlore. 600°C comprised columnar microstructure consisting mixture phase (100) perovskite. 650°C, almost entirely 700°C, predominantly perovskite, but contained much higher fraction 50 pyrochlore was found in significant fractions up to 650°C. Rutherford Backscaftering analysis chemical composition showed that all potassium-deficient tantalum niobium ratio exceeded for conditions. There appeared be relationship between during amount potassium retained films.
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