Preparation of TiNi films by diffusion technology and the study of the formation sequence of the intermetallics in Ti–Ni systems
作者： Xi Shao , Xianglong Guo , Yuanfei Han , Zhengjie Lin , Jining Qin
DOI: 10.1557/JMR.2014.264
关键词:
摘要: This study presented a novel fabrication process for TiNi thin films by vacuum diffusion technology using reactive Ni/Ti/Ni multilayer films. The sandwiched were prepared chemical nickel plating. heat treated various times and temperatures the influences of temperature time on interdiffusion behavior Ti–Ni system researched in detail. results showed that homogeneous film was obtained at 1173 K with 4 h. Moreover, formation sequence intermetallics investigated thermodynamic analysis experiment. It found three compounds — TiNi3, Ti2Ni, formed Ti/Ni interfaces. More importantly, nucleation TiNi3 Ti2Ni prior to because lower reaction Gibbs free energy increasing interface Ti2Ni.
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