作者: Pralay Chakrabarty , Koushik Guha , Gautam Krishna , Srimanta Baishya
DOI: 10.1109/ICIIECS.2015.7193079
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摘要: This paper deals with the design and simulation of Flexure Gate Field Effect Transistor (Flexure-FET) comparative analysis different structures gate using gold (Au) poly-silicon. presents investigation pull-in voltage change in capacitance between channel due to actuation. The effect displacement is reflected drain current characteristics FET ratio ON / OFF investigated for higher sensitivity. has been carried out fixed-fixed suspended uniform meander, non-uniform meander at four corner without configurations also von Mises stress each structure demonstrated this paper.