Vapor deposition method and apparatus for producing an EL thin film of uniform thickness

摘要: There is provided a vapor deposition method for depositing material of an evaporation source on substrate while temperature the uniformly kept. The implemented in apparatus which comprising opposed to vacuum chamber, heater heating across from chamber and equalizing plate between heater. In addition, larger size than its thermal conductivity 200 W·m-1 ·K-1 or more infrared energy emissivity 0.2 more.