Particle reduction on surfaces of chemical vapor deposition processing apparatus
作者： Dong Kil Yim , John M. White , Beom Soo Park , Soo Young Choi
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摘要: A method of reducing the amount particulates generated from surface a processing component used during plasma enhanced chemical vapor deposition thin films. The body comprises an aluminum alloy, and exterior said is texturized to increase area present on surface. texturizing process includes at least one step in which be bead blasted or chemically grained, so that roughness ranges about 50 μ-inch Ra 1,000 Ra.
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