Semiconductor processing with DC assisted RF power for improved control
作者： Shankar Venkataraman , Soonam Park , Jonghoon Baek , Xinglong Chen , Saurabh Garg
DOI:
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摘要: Semiconductor processing systems are described including a process chamber. The chamber may include lid assembly, grid electrode, conductive insert, and ground electrode. Each component be coupled with one or more power supplies operable to produce plasma within the electrically isolated through positioning of plurality insulation members. use switching mechanisms. switches switchable couple components
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