Thin oxide fuse

作者: Tarsaim L. Batra , Sun Chiao , Chen Wang

DOI:

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摘要: An oxide fuse, and method of forming same, formed by a thin layer dielectric between lower electrode substrate an upper electrode. A fuse-programming bias approximately 15V causes Fowler-Nordheim tunneling at low temperature to damage the layer, shorts electrodes together. The is advantageously simultaneously with gate in EEPROM.

参考文章(6)
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Parviz Keshtbod, Electrically erasable PROM cell ,(1983)
Anil Gupta, George Perlegos, Non-volatile memory cell fuse element ,(1982)