Magnetic patterning by means of ion irradiation and implantation
作者： J. Fassbender , J. McCord
DOI: 10.1016/J.JMMM.2007.07.032
关键词:
摘要: A pure magnetic patterning by means of ion irradiation which relies on a local modification the anisotropy multilayer structure has been first demonstrated in 1998. Since then also other properties like interlayer exchange coupling, bias effect, damping behavior and saturation magnetization to name few have be affected or implantation. Consequently, all these effects can used if combined with masking technique employing direct focused beam writing for thus an imprinting artificial domain structure, subsequently modifies integral reversal dynamics film investigated. The present review will summarize how implantation affect structural modifications. main part cover status respect micro- nano structures.
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