Gas discharge derived annular plasma pinch x-ray source
作者： Mladen M. Kekez , Rajendra P. Gupta , Gary D. Lougheed , John H. Lau
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摘要: This invention describes a pulsed plasma pinch x-ray source. In the device initial annulus is derived from an electrical gas discharge in chamber having constricted openings arranged on circle. low mass imploded and pinched by passing high current axially through said annulus. The hot dense copiously emits x-rays has capability of being fired at repetition rates. simple for commercial applications, such as lithography.
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