LPP EUV light source

摘要: An apparatus and method is described for effectively efficiently providing plasma irradiation laser light pulses in an LPP EUV source which may comprise a initial target pulse generating mechanism irradiating initiation with to form having emission region emitting in-band light; the after so as compress material toward of plasma. The wavelength that sufficiently longer than have associated lower critical density resulting absorption occurring within defined by separated from site achieve compression material, region. produce aerial mass ablating cloud sufficient confine favorably increased conversion efficiency. deposition be removed enough surface insure A high efficiency produced extreme ultraviolet (“EUV”) tamper substantially surrounding constrain expansion