Metrology for extreme ultraviolet light source
作者： William N. Partlo , Nam-Hyong Kim , Vahan Senekerimyan , Robert N. Bergstedt , Igor V. Fomenkov
DOI:
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摘要: An extreme ultraviolet light system includes a drive laser that produces an amplified beam; target material delivery configured to produce at location; beam receive the emitted from and direct toward metrology system. The converging lens arranged focus location. collection collect portion of reflected guide lens. dichroic optical device optically separate portions.
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