Method of and apparatus for supply and recovery of target material
作者： Georgiy O. Vaschenko , Jeffrey Gacutan , Theodosios Syrpis , Peter M. Baumgart , Sanjeev Seshagiri
DOI:
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摘要: An EUV light source target material handling system is disclosed which may comprises droplet generator having a reservoir in the he replenished while nozzle portion of maintained at temperature. Also Is for setectively draining spent material.
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