Source material collection unit for a laser produced plasma euv light source
作者： Alexander N. Bykanov , Bjorn Hansson
DOI:
关键词:
摘要: An EUV light source (20) includes a laser (22) for generating beam (1 12) to irradiate material (302) forming plasma and emitting light; dump (100') having receiving structure (306) formed with shaped surface (310) the (112) (300) ejected from irradiation zone (28); system (104a, 104b, 106a, 106b) controlling temperature of within pre-selected range; cooling (222) accumulated in collection chamber (221) an orifice (226) passing material.
google.de 参考文章(7)
William N. Partlo, Alexander I. Ershov, Richard M. Ness, Richard L. Sandstrom, Injection seeded laser with precise timing control ,(2002)
Martin Richardson, EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions ,(2006)
Norbert R. Bowering, Oleh V. Khodykin, Alexander N. Bykanov, Igor V. Fomenkov, Alternative fuels for EUV light source ,(2006)
Oleh V. Khodykin, Alexander N. Bykanov, Alexander I. Ershov, Igor V. Fomenkov, Lpp euv light source drive laser system ,(2006)
Richard L. Sandstrom, Richard C. Ujazdowski, William N. Partlo, Herve A. Besaucele, Palash P. Das, Scott T. Smith, Stuart L. Anderson, William G. Hulburd, Jeffrey Oicles, David W. Myers, Eckehard D. Onkels, Alexander I. Ershov, Daniel J. W. Brown, David S. Knowles, Richard M. Ness, Igor V. Fomenkov, Very narrow band, two chamber, high rep rate gas discharge laser system ,(2002)
Masahiro Tooma, Kimio Yamada, Tetsuya Matsui, Masatsugu Nishi, Manabu Ueno, Laser plasma x-ray source, semiconductor lithography apparatus using the same and a method thereof ,(1998)
Martin Schmidt, Olivier Sublemontier, Marc Segers, Tiberio Ceccotti, Method and device for generating extreme ultraviolet radiation in particular for lithography ,(2002)