Apparatus and method for generating extreme ultraviolet light
作者： Osamu Wakabayashi , Junichi Fujimoto , Tatsuya Yanagida
DOI:
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摘要: An apparatus for generating extreme ultraviolet light is used with a first laser device outputting beam. The includes second beam, beam adjusting unit causing axes of the and beams to substantially coincide each other, chamber, target supply supplying materials into focusing optical system on material plasma generation, an detection detecting from plasma, focus position correction mechanism correcting position, controller based system's detection.
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