LPP EUV plasma source material target delivery system

作者: Oscar Hemberg , J. Martin Algots , Oleh Khodykin , Alexander N. Bykanov

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摘要: An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of irradiation site; drive laser; laser focusing optical element having first range operating center wavelengths; detection radiation second steering comprising highly reflective within at least some part wavelengths transmissive aiming mechanism directing through lens to focus selected position intermediate site. The apparatus further detector positioned detect reflected from droplet.

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