作者： G. S. Lodha , R. V. Nandedkar , P. Tripathi , A. K. Srivastava , M. Nayak
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摘要: In the present investigation we have carried out studies on thermally-induced phase transformations in Mo-Si multilayer. The microstructural characterizations were samples deposited copper grids and heated situ, using a transmission electron microscope. We found that at temperatures above 400°C, sample starts transforming to crystalline phase. Almost complete transformation of multilayer takes place around 750°C Mo 5 Si 3