Extreme ultraviolet light generation system and extreme ultraviolet generation apparatus
作者： 隆志 斎藤 , 伸治 永井
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摘要: This extreme ultraviolet light generation system may include a light-focusing optical configured in such manner that pre-pulse laser and main pulse are focused plasma region; the path axis of pass through region at an angle less than or equal to loss cone relative center magnetic field generated by generator. A first device second be controlled that, after irradiating target outputted from unit with region, is irradiated within delay time ranging 0.5 μs 7 μs.
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