LPP-EUV (Laser-Produced Plasma-Extreme Ultraviolet Lithography) light source system for multi-pulse combined pump

摘要: The invention discloses an LPP-EUV (Laser-Produced Plasma-Extreme Ultraviolet Lithography) light source system for a multi-pulse combined pump. is composed of pump laser pulse group, delay regulation device beam direction generation and synchronous signal controller. group outputs pulses, combination generated through the indication group; enters into device, acted on target material; triggering each by By employment pump, not only can restriction that single power insufficient be overcome, but also energy conversion efficiency optimized regulating combination, thus output capacity photoetching improved.