Light source for lithography exposure process
作者： Liu Bo-Tsun , Chen Hsin-Feng , Chang Han-Lung , Chen Li-Jui
DOI:
关键词:
摘要: A method for generating a radiation light in lithography exposure system is provided. The includes connecting first nozzle assembly coupled to support an outlet of storage member that receives target fuel inside. further guiding the flowing through and supplying droplet into excitation zone via assembly. also moving connect second with outlet. In addition, irradiating laser pulse.
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