作者: Wenbo Liao , Liuyong Zou , Shaona Zheng , Lili Zhao , Xiangxuan Huang
DOI: 10.1007/S11998-020-00384-7
关键词:
摘要: Polyhedral oligomeric silsesquioxane (POSS)-containing fluorinated poly(styrene–acrylate)/SiO2 (POSS-FPSA/SiO2) composite materials were prepared by preemulsification and direct blending method. The SiO2 particles induced aggregated onto the surface of POSS, sol–gel processes simultaneously carried out with addition co-solvent to form raspberry-like structure. 29Si NMR XRD results confirmed that POSS successfully grafted polymer evenly dispersed uniformly in matrix. average diameter latexes increased from 63 81 nm increasing content. AFM WCA images promoted content, which improved roughness hydrophobicity films. XPS spectra displayed two kinds Si–O bonds existed on One was related groups SiO2, other attributed Si–O–Si obtained processes. peak area former decreased 56.86% 38.78%, while latter 43.14% 62.22%. TGA curves demonstrated film exhibited better thermal stability when content 10.0%. In addition, serious phase separation would decrease