Interaction between Arsenic and Aluminum in Germanium

作者: J. O. McCaldin

DOI: 10.1063/1.1735425

关键词:

摘要: The behavior of As in Ge containing regions doped with ∼5×10^20∕cc Al was studied. solubility is enhanced tenfold or more by the heavy doping, on basis (1) measurements conductivity type and (2) negative results a search for compounds x‐ray diffraction. diffusion fronts studied observing progress p‐n junction formed 10^(17)∕cc In. When region doping added, displaced. displacements indicate that diffusing attracted to doping. These are similar those Reiss, Fuller, others Li Si, though detailed understanding not yet available present case.

参考文章(9)
C. D. Thurmond, F. A. Trumbore, M. Kowalchik, Germanium Solidus Curves The Journal of Chemical Physics. ,vol. 25, pp. 799- 800 ,(1956) , 10.1063/1.1743083
A. D. Kurtz, C. L. Gravel, Diffusion of Gallium in Silicon Journal of Applied Physics. ,vol. 29, pp. 1456- 1459 ,(1958) , 10.1063/1.1722968
Howard Reiss, C. S. Fuller, F. J. Morin, Chemical Interactions Among Defects in Germanium and Silicon Bell System Technical Journal. ,vol. 35, pp. 535- 636 ,(1956) , 10.1002/J.1538-7305.1956.TB02393.X
F. A. Trumbore, A. A. Tartaglia, Resistivities and Hole Mobilities in Very Heavily Doped Germanium Journal of Applied Physics. ,vol. 29, pp. 1511- 1511 ,(1958) , 10.1063/1.1722978
David B. Wittry, Resolution of Electron Probe Microanalyzers Journal of Applied Physics. ,vol. 29, pp. 1543- 1548 ,(1958) , 10.1063/1.1722990
F. J. Morin, J. P. Maita, Conductivity and Hall Effect in the Intrinsic Range of Germanium Physical Review. ,vol. 94, pp. 1525- 1529 ,(1954) , 10.1103/PHYSREV.94.1525
Richard A. Gudmundsen, J. Maserjian, Semiconductor Properties of Recrystallized Silicon in Aluminum Alloy Junction Diodes Journal of Applied Physics. ,vol. 28, pp. 1308- 1316 ,(1957) , 10.1063/1.1722640
M. W. Valenta, C. Ramasastry, Effect of Heavy Doping on the Self-Diffusion of Germanium Physical Review. ,vol. 106, pp. 73- 75 ,(1957) , 10.1103/PHYSREV.106.73
Gerhard Backenstoss, Evaluation of the Surface Concentration of Diffused Layers in Silicon Bell System Technical Journal. ,vol. 37, pp. 699- 710 ,(1958) , 10.1002/J.1538-7305.1958.TB03882.X