Linking the operating parameters of chemical vapor deposition reactors with film conformality and surface nano-morphology.

摘要: A multiscale modeling framework is used to couple the co-existing scales, i.e., macro-, micro- and nano-scale, in chemical vapor deposition (CVD) processes. The consists of a reactor scale model (RSM) for description transport phenomena bulk phase (macro-scale) CVD two models nano-scale: (a) feature (FSM) describing film inside features on predefined micro-topography wafer (b) nano-morphology (NMM) surface morphology evolution during thin an initially flat surface. FSM deterministic three sub-models: ballistic species' features, chemistry model, profile algorithm based level set method. NMM stochastic kinetic Monte Carlo coupling RSM with performed through correction species consumption wafer. linking "feeding" rate calculated by NMM. case study Silicon (Si) from Silane. effect reactor's operating parameters Si conformality trenches investigated FSM. formation dimmers (001) as well periodic change predicted.