Investigation of BiFeO3 Multiferroic thin films prepared by metalloorganic chemical vapor deposition

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DOI: 10.1007/S11700-008-1001-5

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摘要: BiFeO3 thin oriented films are grown on SrTiO3(001) and ZrO2(Y2O3)(001) substrates by metalloorganic chemical vapor deposition (MOCVD) in the temperature range T= 500–800°C. Iron dipivaloylmethanate Fe(thd)3 triphenylbismuth Bi(C6H5)3 used as volatile precursors. It is shown that high thermal stability of leads to significant deviations Bi: Fe ratio film from their precursor flow. An increase residence time flow reactor makes this close unity. The film-substrate epitaxial relations determined. found orientation substrate changes with increasing temperature. Optical second harmonic generation (SHG) measurements show presence ferroelectric ordering films. A decrease Curie due stress found. At same time, magnetization noticeably increases compared a single crystal.

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