Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputtering
作者： S. Schiller , G. Beister , W. Sieber , G. Schirmer , E. Hacker
DOI: 10.1016/0040-6090(81)90673-8
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摘要: Abstract We investigated the variations in structure and optical properties of TiO2 films produced by reactive d.c. plasmatron sputtering with most important deposition parameters. Over a wide range, phase composition (ratio rutile to anatase) grain size can be influenced controlled manner substrate temperature oxygen partial pressure. Because their high refractive index low light-scattering losses, plasmatron-sputtered are great interest field interference coatings, e.g. for dielectric multilayer stacks.
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