The interdependence of structural and electrical properties in TiO2/TiO/Ti periodic multilayers

作者: Arnaud Cacucci , Ioannis Tsiaoussis , Valérie Potin , Luc Imhoff , Nicolas Martin

DOI: 10.1016/J.ACTAMAT.2013.03.047

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摘要: Multilayered structures with 14–50 nm periods composed of titanium and two different oxides, TiO TiO2, were accurately produced by DC magnetron sputtering using the reactive gas pulsing process. The structure composition these periodic TiO2/TiO/Ti stacks investigated X-ray diffraction transmission electronic microscopy techniques. Two crystalline phases, hexagonal close packed Ti face centred cubic TiO, identified in metallic-rich sub-layers, whereas oxygen-rich ones comprised a mixture amorphous TiO2 rutile phase. electrical resistivity q measured for temperatures ranging from 300 to 500 K exhibited metallic-like behaviour (q473K = 1.05 � 10 5 1.45 6 X m) temperature coefficient resistance 1.20 3 1 highest period (K 50.0 nm) down negative values 4.97 4 smallest one 14.0 nm). A relationship between dimensions layers their collective is proposed where does not solely depend on total thickness film, but also depends chemical each sub-layer. Charge carrier mobility concentration Hall effect both influenced dimension density ionized scattering centres connected metallic sub-layers. 2013 Acta Materialia Inc. Published Elsevier Ltd. All rights reserved.

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