Method of fabricating sub-micron structures in transparent dielectric materials

摘要: A sub-micron structure is fabricated in a transparent dielectric material by focusing femtosecond laser pulses into the to create highly tapered modified zone with etch properties. The then selectively etched from direction of narrow end so that as selective etching proceeds longitudinally zone, progressively increasing width compensates for lateral occurring closer produce steep- walled holes. unetched portion produced translating beam close and parallel bottom surface can serve an optical waveguide collect light or deliver channel which contain various biological, optical, chemical materials sensing applications.