Surface Characteristics of Monocrystalline ß-SiC dry etched in fluorinated gases

作者: John W. Palmour , R. F. Davis , P. Astell-Burt , P. Blackborow

DOI: 10.1557/PROC-76-185

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参考文章(10)
Douglas H. Bower, Planar Plasma Etching of Polysilicon Using CCl4 and NF 3 Journal of The Electrochemical Society. ,vol. 129, pp. 795- 799 ,(1982) , 10.1149/1.2123973
P. Liaw, R. F. Davis, Epitaxial Growth and Characterization of β ‐ SiC Thin Films Journal of The Electrochemical Society. ,vol. 132, pp. 642- 648 ,(1985) , 10.1149/1.2113921
Shinichi Dohmae, Kentaro Shibahara, Shigehiro Nishino, Hiroyuki Matsunami, Plasma Etching of CVD Grown Cubic SiC Single Crystals Japanese Journal of Applied Physics. ,vol. 24, pp. L873- L875 ,(1985) , 10.1143/JJAP.24.L873
Yasushi Matsui, Masanori Okuyama, Yoshihiro Hamakawa, Preparation of PbTiO3Ferroelectric Thin Film by Laser Annealing Japanese Journal of Applied Physics. ,vol. 20, pp. 23- ,(1981) , 10.7567/JJAPS.20S4.23
W‐J Lu, AJ Steckl, TP Chow, W Katz, None, Thermal Oxidation of Sputtered Silicon Carbide Thin Films Journal of The Electrochemical Society. ,vol. 131, pp. 1907- 1914 ,(1984) , 10.1149/1.2115988
J. W. Palmour, R. F. Davis, T. M. Wallett, K. B. Bhasin, Dry etching of β‐SiC in CF4 and CF4+O2 mixtures Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 4, pp. 590- 593 ,(1986) , 10.1116/1.573854
NCC Lu, CY Lu, MK Lee, CC Shih, CS Wang, W Reuter, TT Sheng, The Effect of Film Thickness on the Electrical Properties of LPCVD Polysilicon Films Journal of The Electrochemical Society. ,vol. 131, pp. 897- 902 ,(1984) , 10.1149/1.2115724
Harold F. Winters, Etch products from the reaction of XeF2 with SiO2, Si3N4, SiC, and Si in the presence of ion bombardment Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 1, pp. 927- 931 ,(1983) , 10.1116/1.582713
Shinji Matsui, Sin'ya Mizuki, Toshiya Yamato, Hiroaki Aritome, Susumu Namba, Reactive Ion-Beam Etching of Silicon Carbide Japanese Journal of Applied Physics. ,vol. 20, pp. L38- L40 ,(1981) , 10.1143/JJAP.20.L38
G. B. Stringfellow, J. W. Faust, R. C. Marshall, C. E. Ryan, Silicon Carbide/1973 ,(1973)