Charge erasure analysis on the nanoscale using Kelvin probe force microscopy

摘要: The charge pattern produced by atomic force microscopy on an insulating surface can be detected the nanoscale using Kelvin probe microscopy. Recent applications of patterns include data storage, nano-xerography, and writing. At present, ongoing development this technology is being restricted a poor understanding modification erasure mechanisms. In study, are achieved applying oppositely polarized pulses to surface. effects pulse height width behavior examined, injection processes compared. Hence, it demonstrated that charges patterned neutralized adjusting appropriately. addition, mechanisms proposed. It suggested application insulatin...