Nano-scale molecular analysis of positive tone photo-resist films with varying dose

摘要: One of the challenges surface characterization at nano-scale is that analytical tools which are capable topological analysis have limited capabilities for molecular characterization. Here we present a study on positive tone photo-resist films with varying exposure dose. The technique based secondary ion mass spectrometry, SIMS, gold nanoparticles (e.g. Au4+400). In methodology sequence individual used to stochastically bombard photoresist films, where each impact results in emission ions from region 10-20 nm diameter. has several unique features enable nano-scale. Firstly, use massive clusters impacts sample nano-volumes, and these nano-volumes multiple can be ejected simultaneously. Secondly, acquisition spectra projectile allows co-ejected collected same spectrum. These two allow tests homogeneity molecules. This particular interest inhomogeneity may result poor quality films. this examined bulk dose post development, order probe physical aggregation chemical transformation partially exposed resist pattern side wall surface. We found cation anion photoacid generator were not removed equally during quencher completely by developer.