22
2014
Wet-strippable silicon-containing antireflectant

Owendi Ongayi , Shintaro Yamada , Charlotte Cutler , James Cameron

9
2016
1
2016
Novel Route to Mesoporous silica with perpendicular nanochannels from polymer/inorganic nanocomposite films

Sivakumar Nagarajan , Mingqi Li , Rajaram Pai , Craig Weinman
Bulletin of the American Physical Society

2005
POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

Yang Song , Tomas Marangoni , Xisen Hou , Joshua Kaitz

2020
Sulfonium Salts of Alicyclic Group Functionalized Semifluorinated Alkyl Ether Sulfonates As Photoacid Generators

Yi Yi , Ramakrishnan Ayothi , Yueh Wang , Mingqi Li
Chemistry of Materials 21 ( 17) 4037 -4046

10
2009
Spatially Controlled Fabrication of Nanoporous Block Copolymers

Mingqi Li , Katsuji Douki , Ken Goto , Xuefa Li
Chemistry of Materials 16 ( 20) 3800 -3808

93
2004
Mussel-Inspired Strategy for Stabilizing Ultrathin Polymer Films and Its Application to Spin-On Doping of Semiconductors

Reika Katsumata , Ratchana Limary , Yuanyi Zhang , Bhooshan C. Popere
Chemistry of Materials 30 ( 15) 5285 -5292

5
2018
Orientation Control in Thin Films of a High-χ Block Copolymer with a Surface Active Embedded Neutral Layer

Jieqian Zhang , Michael B. Clark , Chunyi Wu , Mingqi Li
Nano Letters 16 ( 1) 728 -735

38
2016
Chemical trimming overcoat: an advanced composition and process for photoresist enhancement in lithography

Xisen Hou , Cong Liu , Kevin Rowell , Irvinder Kaur
Advances in Patterning Materials and Processes XXXV 10586

2018
Nano-scale molecular analysis of positive tone photo-resist films with varying dose

Michael J. Eller , Mingqi Li , Xisen Hou , Stanislav V. Verkhoturov
Metrology, Inspection, and Process Control for Microlithography XXXIV 11325

2020
Challenges and opportunities of KrF photoresist development for 3D NAND application

Yang Song , Mingqi Li , Jong Park , Xisen Hou
Advances in Patterning Materials and Processes XXXVII 11326

1
2020
Lithographic Patterning with Block Copolymers

Christopher K. Ober , Mingqi Li , Katsuji Douki , Ken Goto
Journal of Photopolymer Science and Technology 16 ( 3) 347 -350

9
2003
Nanoscale molecular analysis of photoresist films with massive cluster secondary-ion mass spectrometry

Michael J. Eller , Mingqi Li , Xisen Hou , Stanislav V. Verkhoturov
Journal of Micro-nanolithography Mems and Moems 18 ( 2) 023504

7
2019
Understanding photoacid generator distribution at the nanoscale using massive cluster secondary ion mass spectrometry

Xisen Hou , Mingqi Li , Michael J. Eller , Stanislav V. Verkhoturov
Journal of Micro-nanolithography Mems and Moems 18 ( 3) 033502

9
2019
Novel Approaches to Extend 193nm Immersion Technology to Advanced Device Nodes

James Cameron , Mingqi Li , Cong Liu , Jin Wuk Sung
Journal of Photopolymer Science and Technology 29 ( 5) 753 -760

1
2016
Utilizing Roughness Power Spectral Density Variables to Guide Resist Formulation and Understand Impact of Frequency Analysis through Process

Charlotte Cutler , Choong-Bong Lee , James W. Thackeray , Chris Mack
Journal of Photopolymer Science and Technology 31 ( 6) 679 -687

2
2018
Roughness Power Spectral Density as a Function of Aerial Image and Basic Process / Resist Parameters

Charlotte Cutler , Choong-Bong Lee , James W. Thackeray , Peter Trefonas
Journal of Photopolymer Science and Technology 32 ( 6) 779 -790

1
2020
Opportunities and Challenges for Directed Self-Assembly for Advanced Patterning

Shih-Wei Chang , Valeriy V. Ginzburg , Johna W. Kramer , Christopher Lee
Journal of Photopolymer Science and Technology 26 ( 1) 31 -37

2
2013
Ion and Vacuum Ultraviolet Photon Beam Effects in 193 nm Photoresist Surface Roughening: The Role of the Adamantyl Pendant Group

Ting-Ying Chung , David B. Graves , Florian Weilnboeck , Robert L. Bruce
Plasma Processes and Polymers 8 ( 11) 1068 -1079

16
2011