Ion and Vacuum Ultraviolet Photon Beam Effects in 193 nm Photoresist Surface Roughening: The Role of the Adamantyl Pendant Group

作者: Ting-Ying Chung , David B. Graves , Florian Weilnboeck , Robert L. Bruce , Gottlieb S. Oehrlein

DOI: 10.1002/PPAP.201100071

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