POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

摘要: Disclosed herein are polymers comprising a first repeat unit containing an acid labile group and second having structure of formula (1), wherein the contains acidlabile group, R1, R2 R3 each independently hydrogen, halogen, substituted or unsubstituted C1-C12 alkyl C3-C12 cycloalkyl optionally ether carbonyl ester carbonate amine amide urea sulfate sulfone sulfoxide N-oxide sulfonate sulfonamide ora combination thereof, C6-C14 aryl heteroaryl substitution is hydroxyl, cyano, nitro, haloalkyl alkoxy amino, C2-C6 alkanoyl, carboxamido, group; R1 together form ring; n=1-3.