Challenges and opportunities of KrF photoresist development for 3D NAND application
作者： Yang Song , Mingqi Li , Jong Park , Xisen Hou , Yusuke Matsuda
DOI: 10.1117/12.2552140
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摘要: … Here we report the development of novel KrF photoresist materials for 3D NAND application … when Dill B parameter is at 0.15, 0.20, and 0.25, but the profile does not open when Dill B …
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