Photoresist topcoat compositions and methods of processing photoresist compositions
Cong Liu , Deyan Wang , Cheng-Bai Xu , Mingqi Li
1
2020
Photoresist compositions and pattern formation methods
Cong Liu , Jong Keun Park , James F Cameron , Sheng Liu
2024
Polymer, photoresist compositions including the same, and pattern formation methods
AQAD Emad , CUI Li , CEN Yinjie , Wenxu Zhang
2024
Photoresist compositions and pattern formation methods
Mitsuru Haga , Mingqi Li
2024
Polymers useful as surface leveling agents
Mingqi Li , Irvinder Kaur
2024
Photoacid generators, photoresist compositions, and pattern formation methods
Tomas Marangoni , AQAD Emad , Paul LaBeaume , Mingqi Li
2024
Topcoat compositions and photolithographic methods
Cong Liu , Deyan Wang , Cheng-Bai Xu , Mingqi Li
2023
Photoresist compositions and pattern formation methods
Thomas Cardolaccia , Jason A DeSISTO , LEE Choong-Bong , Mingqi Li
2023
Photoresist pattern trimming compositions and pattern formation methods
Irvinder Kaur , LIU Colin , Xisen Hou , Kevin Rowell
2023
Cholate photoacid generators and photoresists comprising same
AQAD Emad , Mingqi Li , Joseph Mattia , Cheng-Bai Xu
2020
Topcoat compositions and pattern-forming methods
Irvinder Kaur , Cong Liu , Doris Kang , Mingqi Li
2018
Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer
Cong Liu , Mingqi Li , Cheng-Bai Xu
2014
Compositions comprising sugar component and processes for photolithography
OH Joon-Seok , Deyan Wang , Cong Liu , Mingqi Li
2012
Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions
F. Weilnboeck , N. Kumar , G. S. Oehrlein , T.-Y. Chung
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 30 ( 3) 031807
19
2012
Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry
F. Weilnboeck , R. L. Bruce , S. Engelmann , G. S. Oehrlein
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 28 ( 5) 993 -1004
40
2010
Electron, ion and vacuum ultraviolet photon effects in 193 nm photoresist surface roughening
T-Y Chung , D Nest , D B Graves , F Weilnboeck
Journal of Physics D 43 ( 27) 272001
18
2010
Block Copolymers II
ML Arnal , V Balsamso , C Coenjarts , J-F Gohy
Springer Science & Business Media 190
1
2005
COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORESIST, AND PROCESS OF PREPARING THE SAME
Kwok Amy M , Aqad Emad , Li Mingqi , Marangoni Tomas
2020
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WITH SUCH COMPOSITIONS
Aqad Emad , Li Mingqi , Cameron James F , Marangoni Tomas
2020
Chemical strategies and control of phase structure in block copolymers
C Ober , FX You , MQ Li , CY Chao
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 230 U4120 -U4121
1
2005