Photoresist compositions and pattern formation methods
作者： Thomas Cardolaccia , Jason A DeSISTO , LEE Choong-Bong , Mingqi Li , Tomas Marangoni
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摘要: A photoresist composition comprises a first polymer formed by free radical polymerization. The first polymer comprises polymerized units formed from a monomer that comprises an ethylenically unsaturated double bond and an acid-labile group; a photoacid generator; a quencher of formula (1):
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