Spatially Controlled Fabrication of Nanoporous Block Copolymers
作者： Mingqi Li , Katsuji Douki , Ken Goto , Xuefa Li , Christopher Coenjarts
DOI: 10.1021/CM0493445
关键词:
摘要: A light-driven process for fabrication of spatially controlled nanoporous polymer films was demonstrated with a new diblock copolymer/small molecule additive system. Poly(α-methylstyrene-b-4-hydroxystyrene) designed and synthesized one block functioning as high-resolution negative-tone photoresist the second being selectively removable. With straightforward spin-coating process, perpendicular cylindrical orientation removable α-methylstyrene microdomain induced over wide range film thicknesses on different substrates. Uniform nanometer-sized pores in submicron-sized photopatterns can be generated by merger “top down” photolithographic imaging subsequent selective removal “bottom up” self-assembled nanostructure.
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