Laser-induced chemical vapor deposition of nanostructured silicon carbonitride thin films

摘要: Laser-induced chemical vapor deposition of silicon carbonitride thin films has been investigated using a continuous wave CO2 laser in parallel configuration with the substrate. The reactant gases this process, hexamethyl disilazane and ammonia, are rapidly heated by radiation due to their absorption energy. Polymerlike or agglomerated nanosized particles formed depending on process conditions. Dense, smooth nanostructured deposits have synthesized at low substrate temperatures (Ts<300 °C) quartz, copper, can be obtained controlled microstructures. Surface morphology, composition, type bonding studied electron microscopy spectroscopic analysis correlated most important parameters. X-ray photoelectron spectroscopy reflectance Fourier transform infrared show that consist Si–N, Si–C, Si–O bonds, linked together x-ray amorphous, polymerlike structure. nitrogen content is about 40% varied adding ammonia gas flow. layers readily contaminated oxygen after exposure air, caused hydrolysis and/or oxidation.