作者: Roberto Fallica , Jason K. Stowers , Andrew Grenville , Andreas Frommhold , Alex P. G. Robinson
DOI: 10.1117/12.2219193
关键词:
摘要: The dynamic absorption coefficients of several CAR and non-CAR EUV photoresists are measured experimentally using a specifically developed setup in transmission mode at the XIL beamline Swiss Light Source. coefficient α Dill parameters ABC were with unprecedented accuracy. In general resists match very closely theoretical value calculated from elemental densities coefficients, whereas exceptions observed. addition, through direct measurements dose-to-clear values, we introduce new figure merit called Chemical Sensitivity to account for all post-absorption chemical reaction ongoing resist, which is also predicts quantitative clearing volume, respectively radius, due photon resist. These may help deeper insight into underlying mechanisms concept volume radius then defined quantitatively calculated.