Photoelectrochemical properties of TiOx layers prepared by DC pulsed unbalanced reactive magnetron sputtering
作者： Milan Mikula , Michal Čeppan , Juraj Kindernay , Dalibor Buc , None
关键词:
摘要: Three sets of titanium oxide layers with different oxygen content were prepared by DC pulsed reactive magnetron sputtering. The characterised their thickness, conductivity, refractive index, band-gap and flat band potential. photoelectric photocatalytic activities the irradiated Xe discharge lamp tested in NaOH phenol water solution, respectively. Rather high activity was found; no expressive increase was, however, observed contrary to expectation connected suboxide forms TiOx.
springer.com
harvard.edu
sci-hub.se 参考文章(12)
Milan Mikula, Jozef Blecha, Michal Čeppan, Photoelectrochemical Properties of Anodic TiO2 Layers Prepared by Various Current Densities Journal of The Electrochemical Society. ,vol. 139, pp. 3470- 3474 ,(1992) , 10.1149/1.2069101
Dwi Wicaksana, Akihiko Kobayashi, Akira Kinbara, Process effects on structural properties of TiO2 thin films by reactive sputtering Journal of Vacuum Science and Technology. ,vol. 10, pp. 1479- 1482 ,(1992) , 10.1116/1.578269
Milan Mikula, Jozef Blecha, Michal Čeppan, Ján Panák, None, Effect of Ti pretreatment on photoelectric properties of TiO2 layers prepared by plasma-anodic oxidation Czechoslovak Journal of Physics. ,vol. 45, pp. 1125- 1133 ,(1995) , 10.1007/BF01692004
M. Mikula, M. Čeppan, J. Panák, Photocorrosion of Passive Films on Titanium in Sulfuric Acid CORROSION. ,vol. 51, pp. 206- 211 ,(1995) , 10.5006/1.3294363
M. Mikula, V. Brezová, M. Cěppan, L. Pach, Ĺ. Karpinský, Comparison of photocatalytic activity of sol-gel TiO2 and P25 TiO2 particles supported on commercial fibreglass fabric Journal of Materials Science Letters. ,vol. 14, pp. 615- 616 ,(1995) , 10.1007/BF00586156
A. Blaková, L. Csölleová, V. Brezová, Effect of light sources on the phenol degradation using Pt/TiO2 photocatalysts immobilized on glass fibres Journal of Photochemistry and Photobiology A-chemistry. ,vol. 113, pp. 251- 256 ,(1998) , 10.1016/S1010-6030(97)00341-9
H. Gerischer, Models for the discussion of the photo-electrochemical response of oxide layers on metals Corrosion Science. ,vol. 29, pp. 257- 266 ,(1989) , 10.1016/0010-938X(89)90034-6
S. Schiller, K. Goedicke, J. Reschke, V. Kirchhoff, S. Schneider, F. Milde, Pulsed magnetron sputter technology Surface and Coatings Technology. ,vol. 61, pp. 331- 337 ,(1993) , 10.1016/0257-8972(93)90248-M
T. Larsson, H‐O. Blom, C. Nender, S. Berg, A physical model for eliminating instabilities in reactive sputtering Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 6, pp. 1832- 1836 ,(1988) , 10.1116/1.575264
M.R Kozlowski, P.S Tyler, W.H Smyrl, R.T Atanasoski, Photoelectrochemical microscopy of oxide films on metals: Ti/TiO2 interface Surface Science. ,vol. 194, pp. 505- 530 ,(1988) , 10.1016/0039-6028(88)90866-7