作者: O. Paleta , A. Danda , L. Štěpán , J. Kvíčala , V. Dědek
DOI: 10.1016/S0022-1139(00)82869-9
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摘要: Abstract Several chlorofluoroalkanols R F -CH 2 OH (R is CF 3 -CFCl, Cl-CF , Cl-CFCl and Cl) their methacrylates or acrylates were synthesized. The corresponding polymeric have properties of highly-sensitive electron-beam X-ray resists for microlithograhy. main step in the syntheses, which start from halogenoalkanes -CCl chemo-selective reduction halogenoesters with sodium borohydride, C-Cl bonds acyl parts esters are not attacked. Relative rates reductions -COOCH influenced by structure halogenoalkyls order Cl : -CFCl CL-CFCl = 4.5: 3.5 1 . A remarkable reactivity decrease rate possessing a atom at β-position group discussed.