Top-surface-metallurgy plate-up bonding and rewiring for multilayer devices

作者: Roy Yu , Kimberley A. Kelly , Peter A. Franklin , Frank R. Morelli , Arthur G. Merryman

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摘要: A device repair process that includes removing a passivation polyimide layer. The layer is removed using first-half ash followed by second-half ash. then cleaned sodium hydroxide (NaOH) and subsequent light step implemented. After the removed, seed deposited on device. photoresist formed bond sites are in photoresist. Repair metallurgy plated through sites. coupling to fixture applying current for plating fixture. contact between made though bottom surface metallurgy. plating, residual laser delete implemented disconnect isolate nets of

参考文章(22)
Dorota Temple, Arnold Reisman, Iwona Turlik, Metal-organic chemical vapor deposition for repairing broken lines in microelectronic packages RTI International. P.O. Box 12194, Research Triangle Park, NC 27709-2194. Tel: 919-541-6000; e-mail: publications@rit.org; Web site: http://www.rti.org. ,(1990)
Peter K. Charvat, Robert M. Guptill, Chi-Hwa Tsang, Dry process for stripping photoresist from a polyimide surface ,(1992)
Dyer A. Matlock, Jimmy C. Black, Bruce E. Roberts, Electrodeposition of submicrometer metallic interconnect for integrated circuits ,(1985)
Chengjun Julian Chen, Robert Jacob Von Gutfeld, High frequency electrochemical repair of open circuits ,(1990)
John Joseph Donelon, Modest Michael Oprysko, James Patrick Doyle, Robert Jacob Von Gutfeld, Stephan Mark Rossnagel, Jerry Elden Hurst, Laser methods for circuit repair on integrated circuits and substrates ,(1989)