Electrochemical nucleation and growth of silicon in the KF-KCl-K2SiF6 melt
作者： Yurii P Zaykov , Sergey I Zhuk , Andrey V Isakov , Olga V Grishenkova , Vladimir A Isaev
DOI: 10.1007/S10008-014-2729-Z
关键词:
摘要: … of kinetics and mechanism of the … nucleation and growth mechanism. The chronoamperometric experiments were used for investigating the nucleation and growth mechanism of silicon …
springer.com
sci-hub.se 
urfu.ru 参考文章(32)
B.R. Scharifker, J. Mostany, Three-dimensional nucleation with diffusion controlled growth: Part I. Number density of active sites and nucleation rates per site Journal of Electroanalytical Chemistry. ,vol. 177, pp. 13- 23 ,(1984) , 10.1016/0022-0728(84)80207-7
Yu. D. Gamburg, Overlapping of Diffusion Zones during the Growth of Electrodeposited Crystal Nuclei Russian Journal of Electrochemistry. ,vol. 39, pp. 318- 320 ,(2003) , 10.1023/A:1022840214131
Benjamin Scharifker, Graham Hills, Theoretical and experimental studies of multiple nucleation Electrochimica Acta. ,vol. 28, pp. 879- 889 ,(1983) , 10.1016/0013-4686(83)85163-9
Oscar Díaz-Morales, Jorge Mostany, Carlos Borrás, Benjamin R. Scharifker, Current transient study of the kinetics of nucleation and diffusion-controlled growth of bimetallic phases Journal of Solid State Electrochemistry. ,vol. 17, pp. 345- 351 ,(2013) , 10.1007/S10008-012-1881-6
Yu. D. Gamburg, Number of Nuclei Formed during Electrocrystallization and Overall Time Dependence of Their Growth Current Russian Journal of Electrochemistry. ,vol. 40, pp. 78- 85 ,(2004) , 10.1023/B:RUEL.0000012078.43792.74
Luc Heerman, Anthony Tarallo, Theory of the chronoamperometric transient for electrochemical nucleation with diffusion-controlled growth Journal of Electroanalytical Chemistry. ,vol. 470, pp. 70- 76 ,(1999) , 10.1016/S0022-0728(99)00221-1
D. Elwell, Gopalakrishna M. Rao, Electrolytic production of silicon Journal of Applied Electrochemistry. ,vol. 18, pp. 15- 22 ,(1988) , 10.1007/BF01016199
S. Fletcher, C.S. Halliday, D. Gates, M. Westcott, T. Lwin, G. Nelson, The response of some nucleation/growth processes to triangular scans of potential Journal of Electroanalytical Chemistry. ,vol. 159, pp. 267- 285 ,(1983) , 10.1016/S0022-0728(83)80627-5
R. Boen, J. Bouteillon, The electrodeposition of silicon in fluoride melts Journal of Applied Electrochemistry. ,vol. 13, pp. 277- 288 ,(1983) , 10.1007/BF00941599
KL Carleton, JM Olson, A Kibbler, Electrochemical Nucleation and Growth of Silicon in Molten Fluorides Journal of The Electrochemical Society. ,vol. 130, pp. 782- 786 ,(1983) , 10.1149/1.2119803