Method for producing sputtering target material
作者： Ken Hagiwara , Ritsuya Matsuzaka , Somei Yarita , Noriaki Hara
DOI:
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摘要: The invention provides a method for producing sputtering target material including electrolyzing molten salt mixture containing precious metal and solvent salt, to thereby deposit or alloy. enables simplification of production steps produces high-purity materials. In addition, the electrodeposited alloy is heat-treated at temperature least 800° C. but lower than melting point metal, produce higher purity.
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