Numerical investigation of ion energy distribution functions in single and dual frequency capacitively coupled plasma reactors
作者： V. Georgieva , A. Bogaerts , R. Gijbels
DOI: 10.1103/PHYSREVE.69.026406
关键词:
摘要: Ion-energy-distribution functions (IEDFs) are numerically investigated in capacitively coupled (cc) radio frequency (rf) Ar/CF(4)/N(2) discharges by a one-dimensional particle-in-cell/Monte Carlo model. The simulation considers electron-neutral collisions, various kinds of collisions ions (Ar+, CF+3, N+2, F-, and CF-3) with neutral, positive-negative ion, electron-ion recombination. influence pressure, applied voltage amplitude, on the Ar+, N+2 IEDFs is presented. dependence regime simulations mixture single (13.56 MHz) dual (2+27 MHz or 1+27 cc reactors. A comparison results analytical calculations collisionless rf sheath discussed. show that shift toward low energies increasing pressure decreasing amplitude. Ar+ exhibit secondary maxima due to charge transfer collisions. CF+3 IEDF has peak at high consistency average potential drop. broad bimodal.
harvard.edu
researchgate.net 
sci-hub.se 参考文章(52)
Michael A Lieberman, Alan J Lichtenberg, Principles of Plasma Discharges and Materials Processing ,(1994)
Shahid Rauf, Mark J. Kushner, Argon metastable densities in radio frequency Ar, Ar/O2 and Ar/CF4 electrical discharges Journal of Applied Physics. ,vol. 82, pp. 2805- 2813 ,(1997) , 10.1063/1.366111
C.K. Birdsall, A.B Langdon, Plasma Physics via Computer Simulation Plasma Physics via Computer Simulation. ,(1991) , 10.1201/9781315275048
A. Manenschijn, G. C. A. M. Janssen, E. van der Drift, S. Radelaar, Measurement of ion impact energy and ion flux at the rf electrode of a parallel plate reactive ion etcher Journal of Applied Physics. ,vol. 69, pp. 1253- 1262 ,(1991) , 10.1063/1.347311
J. Liu, G. L. Huppert, H. H. Sawin, Ion bombardment in rf plasmas Journal of Applied Physics. ,vol. 68, pp. 3916- 3934 ,(1990) , 10.1063/1.346278
W. M. Greene, M. A. Hartney, W. G. Oldham, D.W. Hess, Ion transit through capacitively coupled Ar sheaths: Ion current and energy distribution Journal of Applied Physics. ,vol. 63, pp. 1367- 1371 ,(1988) , 10.1063/1.339965
E Gogolides, M Stathakopoulos, A Boudouvis, Modelling of radio frequency plasmas in tetrafluoromethane (CF4): the gas phase physics and the role of negative ion detachment Journal of Physics D. ,vol. 27, pp. 1878- 1886 ,(1994) , 10.1088/0022-3727/27/9/011
W J Goedheer, Lecture notes on radio-frequency discharges, dc potentials, ion and electron energy distributions Plasma Sources Science and Technology. ,vol. 9, pp. 507- 516 ,(2000) , 10.1088/0963-0252/9/4/306
E Kawamura, V Vahedi, M A Lieberman, C K Birdsall, Ion energy distributions in rf sheaths; review, analysis and simulation Plasma Sources Science and Technology. ,vol. 8, ,(1999) , 10.1088/0963-0252/8/3/202
V. Georgieva, A. Bogaerts, R. Gijbels, Numerical study of Ar/CF4/N2 discharges in single- and dual-frequency capacitively coupled plasma reactors Journal of Applied Physics. ,vol. 94, pp. 3748- 3756 ,(2003) , 10.1063/1.1603348