Photoresist cleaning solutions and methods for pattern formation using the same
作者： Cheol Bok , Geun Lee
DOI:
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摘要: A photoresist cleaning solution and method for forming patterns using the same. More specifically, disclosed are a comprising H2O an ionic surfactant represented by Formula 1, pattern By spraying of present invention over film before and/or after exposing step, formation in undesired region caused ghost images can be removed.
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