Study on the Influence of Variation of Contact Arc Zone on the Single-Pass Sawing of Sapphire Wafer

作者: Jianyun Shen , Lang Lu , Yuanyuan Gong , Xipeng Xu

DOI: 10.1007/S12541-018-0150-8

关键词:

摘要: Single-pass sawing (SPS), a significant cutting process widely used in the manufacturing of optical components optoelectronic fields, which can greatly improve quality products by reducing proportion edge chipping. In this paper, mechanism SPS was introduced novel approach deep analysis variation contact arc zone. Setting sapphire wafers as workpiece, study performed comparative experiments three specific zones, would further make thorough inquiry on related machining mechanism. The difficulty degree and topography surface during were also analyzed. reflected force ratio, surfaces compared SEM Digital Microscope. results indicate that lower is, easier it be machined SPS. And best appears Arc 2 (arc angle = 20°), set an excellent reference for other materials single-pass is derived basis traditional model, will serve useful references to both industrial academia.

参考文章(15)
Bi Zhang, Trevor D. Howes, Material-removal mechanisms in grinding ceramics CIRP Annals. ,vol. 43, pp. 305- 308 ,(1994) , 10.1016/S0007-8506(07)62219-7
Woong-Kirl Choi, Seong-Hyun Kim, Seung-Geon Choi, Eun-Sang Lee, Chul-Hee Lee, Effect of pad’s surface deformation and oscillation on monocrystalline silicon wafer surface quality International Journal of Precision Engineering and Manufacturing. ,vol. 15, pp. 2301- 2307 ,(2014) , 10.1007/S12541-014-0594-4
Xipeng Xu, Yuan Li, Stephen Malkin, Forces and Energy in Circular Sawing and Grinding of Granite Journal of Manufacturing Science and Engineering-transactions of The Asme. ,vol. 123, pp. 13- 22 ,(2001) , 10.1115/1.1344900
Dong Hui Wen, Yue Hua Wan, Tao Hong, Surface Integrity Induced by Abrasive Machining Sapphire Wafer Advanced Materials Research. pp. 311- 316 ,(2008) , 10.4028/WWW.SCIENTIFIC.NET/AMR.53-54.311
ZhiJie Wang, J. H. Wang, Stephen Lee, SuYing Yao, Richard Han, Yeqing Q. Su, 300-mm Low- ${\hbox {k}}$ Wafer Dicing Saw Development IEEE Transactions on Electronics Packaging Manufacturing. ,vol. 30, pp. 313- 319 ,(2007) , 10.1109/TEPM.2007.906488
S.B. Lee, Y. Tani, T. Enomoto, H. Sato, Development of a Dicing Blade With Photopolymerizable Resins for Improving Machinability CIRP Annals. ,vol. 54, pp. 293- 296 ,(2005) , 10.1016/S0007-8506(07)60106-1
Egemen Teomete, Roughness damage evolution due to wire saw process International Journal of Precision Engineering and Manufacturing. ,vol. 12, pp. 941- 947 ,(2011) , 10.1007/S12541-011-0126-4
P.S. Sreejith, G. Udupa, Y.B.M. Noor, B.K.A. Ngoi, Recent Advances in Machining of Silicon Wafers for Semiconductor Applications The International Journal of Advanced Manufacturing Technology. ,vol. 17, pp. 157- 162 ,(2001) , 10.1007/S001700170185
S. Y. Luo, Z. W. Wang, Studies of chipping mechanisms for dicing silicon wafers The International Journal of Advanced Manufacturing Technology. ,vol. 35, pp. 1206- 1218 ,(2008) , 10.1007/S00170-006-0800-3
Jau-Wen Lin, Ming-Hon Cheng, Investigation of chipping and wear of silicon wafer dicing Journal of Manufacturing Processes. ,vol. 16, pp. 373- 378 ,(2014) , 10.1016/J.JMAPRO.2014.04.002