Particulate removal from point of use exhaust scrubbers
作者： Tim Herman , W. Leon Cooley , John D. Miller , Robert R. Moore
DOI:
关键词:
摘要: A submicron filter assembly (24) is added to an exhaust gas controlled destruction and oxidation unit (10). Controlled (10) treats from at least one semiconductor wafer fabricating reactor. The filters particles out of the treated prevent visible plumes forming in fab systems (stacks). are ideally suited for use point generation gases. In embodiment invention, comprises electrostatic (26). (26) includes a positively charged first grid (28) grounded second (30). may include mist screen removing particulate build-up. another (36) eliminator (38) HEPA (40).
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