A Nanoscale Plasma Etching Process for Pole Tip Recession of Perpendicular Recording Magnetic Head

作者: Shoubin LIU , Dayao HE

DOI: 10.5755/J01.MS.22.2.12953

关键词:

摘要: The pole tip of perpendicular recording head is constructed in a stacked structure with materials NiCoFe, NiFe, Al 2 O 3 and AlTiC. surfaces different are set at heights below the air-bearing surface slider. This paper presented plasma dry etching process for Pole Tip Recession (PTR) based on an ion beam system. Ar mixed small incident angles have high removal rate to nonmagnetic material. It was utilised etch reference until it reaches MT value. Low-energy angle removes selective ratios 1 : 1.6 : 2.5 : 2.9 (AlTiC/Al /NiCoFe/NiFe). selected form PTR. High-energy large exhibits almost same rates all materials. adopted make overall while keeping recessed profile. An atomic force microscope (AFM) used measuring value base surface. A transmission electronic microscopy (TEM) chosen examine thickness subsurface damage. batch production showed that can be successfully nanofabricated three-step process. DOI: http://dx.doi.org/10.5755/j01.ms.22.2.12953

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