Oxygen plasma etching of diamond-like carbon coated mold-die for micro-texturing

摘要: Abstract Diamond-like carbon (DLC) coating via PVD/CVD on the SKD11 substrate was employed to make micro-texturing by using high density oxygen plasma etching. Original pattern metal chromium first line-drawn surface of DLC coating; then, it subjected Even without any hazardous etchants such as CF4, etching rate attained only gas; i.e. 5 μm/H. Plasma diagnosis spectroscopy proved that this process should be controlled activated atom flux {O, O*}. Direct chemical reaction C (in DLC) + O → CO, or, DLC) + O* → C O, drove process. Detection CO peaks in wave length range from 200 300 nm also advanced reactions. This behavior insensitive line width (WG) and pitch (PG) for 2 μm